HB LEDs & OLEDs. Complete thin film process solutions

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1 HB LEDs & OLEDs Complete thin film process solutions

2 Get off to a flying start for all your LED thin film deposition and etch processes From 2 inch to 8 inch Manual or fully automated substrate handling Sapphire and GaN processing Damage free deposition and etch

Choose a partner with staying power Choose a partner with proven LED production know how. Evatec and are working together to deliver complete thin film process solutions you can rely on.

3 Choose a partner with staying power Choose a partner with proven LED production know how. Evatec and are working together to deliver complete thin film process solutions you can rely on. With over 100 LED systems in production, our platforms are designed with the operator in mind - simple, safe substrate handling, simple operation, and easy to maintain. From low temperature processes for OLEDs to the most demanding HB LED optical stacks, our deposition and etch systems are delivered with robust processes and proven hardware for production 24/7. But delivering the equipment today is just the start: our LED support team helps with new process developments and extensions to machine capability to give our platforms the longest lifetimes in the industry. LED Thin Film Powerhouse

4 LED Deposition Processes Processes that fit together Choose from a portfolio of high rate deposition processes that fit together perfectly. From DBRs with wide angular range to pinhole free, stress free mask layers, our applications specialists are here to help you choose the best deposition technology and film designs for your production line and package design. Masks Current spreading Contacts Reflectors (DBRs) SiO 2 and Si 3 N 4 by PECVD without pinholes & particles, temperatures <80 C for organics processing ITO and other TCOs with customised optical and electrical performance. Choose from evaporation or low temperature sputter without GaN plasma damage p & n metal stack contact electrodes by evaporation or sputter. Deposition at high rates and without GaN damage Metals, metal / dielectric or DBR stacks by evaporation or sputter, customised for LED chip package design

LED Etch Processes Hit the target every time Highly repeatable processes, wafer to wafer, run to run are the key to the highest yields on 2, 4 and even 6 inch substrates.

5 LED Etch Processes Hit the target every time Highly repeatable processes, wafer to wafer, run to run are the key to the highest yields on 2, 4 and even 6 inch substrates. Our sapphire substrate patterning processes (PSS) are the industry standard. For additional etch processes in your thin film stack, optimise conditions for vertical or sloped walls according to LED package design. PSS Patterning Substrate patterning for increased extraction efficiency with optimised recipes to match your exact cone angles and height requirements GaN etch by Inductively Coupled Plasma (ICP) etch with selectivity >1 and etch rates up to 200nm/min

6 LED Production Platforms Gold Medal performance Our production platforms already run at the world s largest LED manufacturers. Evatec and CORIAL custom solutions include automated handling, direct wafer processing or carriers and integration of upstream or downstream process modules. Platform Technology LED Processes Capacity Loading Evatec BAK 761 Evaporation PIAD Contacts Curr. Spreading Reflectors 2 inch inch 42 6 inch 20 8 inch 9 Manual Cassette to cassette (as option) Evatec Radiance Platform Sputter ICP etch PECVD Contacts Curr. Spreading Reflectors 2 inch inch 48 6 inch 21 8 inch 16 Cassette to cassette 300IL ICP-RIE PSS Process GaN etch 2 inch 21 (PSS) 2 inch 27 (GaN) 4 inch 7 6 inch 1 Manual, load lock, preloaded shuttle PS600 ICP-RIE PSS Process GaN etch 4 inch 24 6 inch 16 Automatic, cassette to cassette D C Low temp PECVD <80 C Mask layers (SiN or SiO 2 ) 2 inch inch 25 6 inch 9 Manual, preloaded carriers Hardware Processes Advanced Control Systems

7 About Evatec Evatec offers complete machine and process solutions, for thin film deposition and etch in the optical and semiconductor markets. Evatec engineers are able to offer practical production advice from R&D to prototyping and mass production. We recognize that no single technique offers the answer to all problems. With a technology portfolio including standard and enhanced evaporation as well as sputter, we are ready to offer sampling services and custom engineering to meet our customers individual needs. We provide sales and service through our global network of local offices. Evatec Ltd. Lochrietstrasse 14 CH-8890 Flums Switzerland T:: E: info@evatecnet.com About CORIAL With more than 30 years experience in delivering custom plasma deposition and etch systems, our LED systems already process more than 1,000,000 two inch wafers a month at the worlds major manufacturers. With over 300 square metres of clean room area for development, assembly and test we offer sampling, customised process development, and full production solutions for a wide range of applications including LED production, MEMS and failure analysis. 60 chemin des Fontaines Bernin France T: +33 (0) E: corial@corial.net Product descriptions, photos and data are supplied within the brochure for general information only and may be superseded by any data contained within quotations, manuals or specifications from either Evatec, or their representatives.

LEP400 Etch Depth Monitor Real-time, in-situ plasma etch depth monitoring and end point control plus co-linear wafer vision system

LEP400 Etch Depth Monitor Real-time, in-situ plasma etch depth monitoring and end point control plus co-linear wafer vision system Base Configuration Etch Depth Monitoring LEP400 Recessed Window Plasma