TM End Blocks e-cathode Plasma Treatment Magnetics Swing Cathode display architectural decorative solar automotive
About Us Imagine... Shaping the future We take pride that our flexibility and reliability, providing service and support wherever and whenever needed, contributes to our customers' success. Benefits of Rotary Cathodes Cost Rotary cathode target utilization is characteristically between 70%-85% versus 25%-40% for planar targets. The initial capital investment for rotaries is less than typical planar cathodes for 1.5 meter systems and larger. In addition, fewer rotary cathodes are needed for completing the same coating as planar targets when using temperature-sensitive materials. Time Your company will have longer campaign times as most rotary targets have 3-4 times the sputter material available due to the geometry of the target. There is reduced target burn-in as there is much less redeposition onto the rotary cathodes means not spending time burning in. Changing targets with SCI rotary cathodes is much faster than other rotaries and planars. Film Quality The smaller redeposition zone surface area on rotary cathodes reduces the probability of particle generation that can end up on the surface of the substrate. The smaller redeposition zone on the rotary cathodes in comparison to planar cathodes reduces the probability of arcing when sputtering dielectric films. Lower target temperatures and more efficient cooling of the target allow rotary cathodes to run at higher power densities than planar cathodes without forming nodules when depositing TCO s such as ITO. Process Rotaries have higher deposition rates, primarily for materials that are temperature-sensitive. There is better process stability over the target lifetime because deposition angles do not change and process voltage remains nearly constant over the lifetime of the target.
Perform... Beyond expectations The proven dependability of our products ensures our primary place in the industry for the future. Core Capabilities Design Our 3D design work is done using SolidWorks which allows us to exchange files with our customers. Simulation and Testing Using COMSOL Finite element analysis is used by SCI for magnetic modeling. This helps our customers maximize utilization and uniformity. SCI is able to simulate molecular and transition flow analysis. This can be done on SCI gas manifold designs to ensure uniform gas distribution. We have the capabilities of completing thermal and flow simulations for water cooling by calculating the temperature at the water inlet and outlet, and at various points of the target tube, including surface and bonding layers. Customers will feel confident that they are using the correct water flow parameters. Manufacturing and Assembly SCI has a full, in-house fabrication shop with a 5mx2.5m milling machine for large jobs. All cathode, magnetics, e-cathode programming, and electronics assembly is completed at our facility in Minnesota. Quality Control Documented procedures, employee training, and audits are part of our ISO compliant quality system. In order to ensure complete accuracy of our products, we have complete In-house testing, evaluation, and characterization procedures.
Product Selections Internal End Blocks: The SC-Series single ended design is the most reliable, highest power rated, lowest maintenance rotary end block available in its class. The MC-Series single ended design provides the same high performance and reliability as the SC-Series in a more compact package. The TC-Series is a compact, dual ended, internal end block designed to accommodate standard target sizes. This is an excellent product for retrofitting into limited spaces. External End Blocks: The SM-Series end block is the most reliable, highest power rated, lowest maintenance end block available in its class. The MM-Series end block offers the same high performance and reliability as the SM-Series in a more compact, flexible package. The CM-Series end block combines high performance and reliability in a very compact and lightweight design. Swing Cathode and Swing-DUO Software The Swing Cathode builds on all SCI external end blocks to provide customers with a highly uniform, large area coating solution for static substrates. The Swing-DUO (Dynamic Uniformity Optimization) Software is designed to simulate the combined cathode array uniformity for optimized motion profiles.
RAM-Bar Magnetics The Remotely Adjustable Magnet Bar allows customers to adjust the distance between the magnet pack and the target surface from outside the system during operation to optimize uniformity. TRM-Bar, SRM-Bar,QRM-Bar, and mqrm-bar Magnetics SCI magnetics lead the industry in uniformity, versatility, and reliability. Our bars are produced with high strength, fully encapsulated magnets for many years of trouble-free operation. envis-ion DMPTS The envis-ion TM Dual Magnetron Pretreatment Source is a robust solution for plasma pretreatment to improve adhesion and durability. It is compatible with adjacent process and can be end block, cantilever, or remote mounted. e-cathode Complete Cathode and Integrated Electronics The e-cathode system is a complete cathode solution designed for the OEM interested in a complete turnkey solution or end users interested in adding cathodes to their system. Available with integrated controls for all end block types.
SC-Series End Block FEATURES: Patented power-delivery technology Unique target attachment method Durable, long-life rotary seals Industry standard mounting to lid Non-proprietary target design Patented water fill/drain feature BENEFITS: Highest reliability in today's market Easy to install Retrofit from competitor end blocks Fastest target change available 1 hour annual maintenance 3 hour total end block rebuild Lowest maintenance cost Use targets from any vendor No inductive heating impact - no brush dust No galvanic corrosion Patented SC-Series Internal Mount End Block Average End Block Weight: 40 kg RETROFIT FROM COMPETITOR END BLOCKS: No lid modifications required Use existing utilities No changes to power, gas, or anodes Keep your current magnet assemblies or upgrade to the TRM-Bar, or QRM-Bar, or mqrm-bar TM magnetics Adaptable to your current target design Use for any length system NEW SYSTEM INSTALLATIONS: Available as individual end blocks, end blocks plus the TRM-Bar, QRM-Bar, or mqrm-bar TM magnetics, or complete e-cathode systems - ready to install UPGRADE PLANARS TO ROTARIES: Increase the output and quality of your existing coater without adding chambers Coater modification and integration support available Model Power V/A Target (mm) SC Up to 200kW DC or 80 khz MFAC 1500V/450A Up to 4000
The industry-standard size SC-Series, internal mount end block is the lowest cost, highest power, and most reliable end block available.
MC-Series End Block FEATURES: Patented power-delivery technology Unique target attachment method Durable, long-life rotary seals Compact design Non-proprietary target design Patented target water fill/drain feature BENEFITS: Highest reliability in today's market Easy to install Retrofit from competitor end blocks Fastest target change available 1 hour annual maintenance 3 hour total end block rebuild Lowest maintenance cost Use targets from any vendor No inductive heating impact - no brush dust No galvanic corrosion Patented MC-Series Internal Mount End Block Average End Block Weight: 20 kg NEW FEATURES: Wider drive belt allows longer, heavier targets Improved insulator with grounded base enhances reliability and heat capability Magnet bar can be set to any angle Water dam to eliminate damage from external water leaks All MCs fit the same hole pattern NEW SYSTEM INSTALLATIONS: Available as individual end blocks, end blocks plus the TRM-Bar, QRM-Bar, or mqrm-bar TM magnetics, or complete e-cathode systems - ready to install UPGRADE PLANARS TO ROTARIES: Increase the output and quality of your existing coater without adding chambers Coater modification and integration support available Model Power V/A Target (mm) MC Up to 100kW DC or 80 khz MFAC 1500V/225A Up to 2500
The MC-Series, internal mount end block provides high-performance and reliability in a compact design
TC-Series End Block FEATURES: Patented power-delivery technology Unique target attachment method Durable, long-life rotary seals Most compact design available for standard, industrial targets Non-proprietary target design Patented target water fill/drain feature Fits standard target size BENEFITS: Excellent reliability Simple to install Fast target change 2 hour annual maintenance 3 hour total end block rebuild Very low maintenance cost Use targets from any vendor No inductive heating impact - no brush dust No galvanic corrosion No special target size needed TC-Series Internal Mount End Block Average End Block Weight: 10 kg RETROFIT AND UPGRADES: Available as individual end blocks, end blocks plus the TRM-Bar, QRM-Bar, or mqrm-bar TM magnetics, or complete e-cathode systems - ready to install RETROFIT FROM PLANARS Increase the output and quality of your existing coater without adding chambers Coater modification and integration support available Model Power V/A Target (mm) TC Up to 40kW DC or 80 khz MFAC 1500V/100A Up to 1500mm
The TC-Series, internal mount end block combines high-performance and reliability in our most compact design
SM-Series End Block FEATURES: Customizable drive shaft length Compact and flexible form factor Easy access water seal cartridge Patented power-delivery technology Simple design - fewer parts and highly reliable Magnet bar externally adjusts to any angle Patented target water fill/drain feature BENEFITS: Wider substrate coverage than traditional internal end blocks Fits most chamber designs All utilities are external and remain attached during target changeover High-packing density; dual cathodes in 400mm space Drive motors mount up, down, inward, or outward High-power with no inductive heating impact - no brush dust Simple, in-house maintenance Allows co-sputtering, tighter plasma coupling, and limits shield coating NEW SYSTEM INSTALLATIONS: Patented SM-Series External Mount End Block Average End Block Weight: 60 kg UPGRADE PLANARS TO ROTARIES: Coater modification and integration support available Switch between planars and outside mounts in the same position CANTILEVER CAPABILITY: Metric: XY/2 + 16X 2 < 138 Imperial: XY/2 + 0.9X 2 < 12,000 X = Backing tube length (meters or inches) Y = Weight of target (kg or lbs only) Our compact design allows chamber design flexibility and the ability to install more cathodes in your system Integrate with TRM-Bar, QRM-Bar or mqrm-bar TM magnetics and e-cathode systems - ready to install Model Power V/A Target (mm) SM Up to 200kW DC or 80 khz MFAC 1500V/450A Up to 4000
The SM-Series external mount end block uses the same patented technology as our SC-Series end block to deliver outstanding value, performance, and reliability Drive motor mounts facing in or out 277 VARIES 187 169 425 109 165 RECOMMENDED 140 MINIMUM 6 x 10.20 23 M12x1.75 18 ON A 206.40 BC DO NOT BREAK THRU 279 391 203 205 MIN. Ra0.8 223.00 CLEAN UP 205 MIN. 30 MIN. NOTE: THICKER THAN 30mm PLATE IS RECOMMENDED TO INCLUDE A PILOT BORE FOR THE CATHODE.
MM-Series End Block FEATURES: Customizable drive shaft length Very compact and flexible form factor Easy access water seal cartridge Patented power-delivery technology Simple design - fewer parts and highly reliable Magnet bar externally adjustable to any angle Patented target water fill/drain feature BENEFITS: All utilities are external Utilities remain attached during target changeover Wider substrate coverage than traditional internal end blocks Fits most chamber designs High-power with no inductive heating impact - no brush dust High-packing density; dual cathodes in 350mm space Drive motors mount up, down, inward or outward Simple, in-house maintenance Allows co-sputtering, tighter plasma coupling, and limits shield coating NEW SYSTEM INSTALLATIONS: Patented MM-Series External Mount End Block Average End Block Weight: 30 kg UPGRADE PLANARS TO ROTARIES: Coater modification and integration support available Switch between planars and sidemounts in the same position CANTILEVER CAPABILITY: Metric: XY/2 + 16X 2 < 92 Imperial: XY/2 + 0.9X 2 < 8,000 X = Backing tube length (meters or inches) Y = Weight of target (kg or lbs only) Our compact design allows chamber design flexibility and the ability to install more cathodes in your system Integrate with TRM-Bar, QRM-Bar or mqrm-bar TM magnetics and e-cathode systems - ready to install Model Power V/A Target (mm) MM Up to 100kW DC or 80 khz MFAC 1500V/225A Up to 2500
The MM-Series external mount end block uses the same patented technology as our MC-Series end block to deliver outstanding value, performance, and reliability in a compact design
CM-Series End Block FEATURES: Customizable drive shaft length Ultra compact and flexible form factor Easy access water seal cartridge Simple design, fewer parts, and highly reliable Magnet bar externally adjustable to any angle Patented target water fill/drain feature Fits industrial standard 125mm ID target sizes or smaller, 80mm size BENEFITS: All utilities are external Utilities remain attached during target changeover Wider coverage than drop-in end blocks Fits most chamber designs Excellent power capability with no inductive heating impact - no brush dust High packing density; dual cathodes in 220mm space with an 80mmID target tube Drive motors 3600 positioning Simple, in-house maintenance Allows co-sputtering, tight plasma coupling, and limits shield coating NEW SYSTEM INSTALLATIONS: Our compact end block allows chamber design flexibility and the ability to install more cathodes in your system Integrate with SRM-Bar TRM-Bar, QRM-Bar, or mqrm-bar magnetics and e-cathode systems with a 80mm or 125mm ID target tube Patented CM-Series External End Block Average End Block Weight: 15 kg UPGRADE PLANARS TO ROTARIES: Coater modification and integration support available Switch between planars and rotaries in the same position CANTILEVER CAPABILITY: Metric: XY/2 + 16X 2 < 23 Imperial: XY/2 + 0.9X 2 < 2,000 X = Backing tube length (meters or inches) Y = Weight of target (kg or lbs only) Model Power V/A Target (mm) CM Up to 20kW DC or 80 khz MFAC 1500v/50A Up to 1000mm
CM-Series - 125mm ID Target The CM-Series external end block combines high-performance and reliability in a very compact and lightweight design 95 FLANGE FOR 125 ID TARGET TUBE 214 283 DRIVE SHAFT (VARIES) 150 306 162 TARGET CLAMP 95mm MINIMUM DRIVE SHAFT WITH A 20mm WALL (36mm MINIMUM WITH SPECIAL PARTS) Ra0.8 123.00 CLEAN UP 6X 6.80 16.75 M8X1.25 13 ON A 108 B.C. DO NOT BREAK THRU 20 MIN. 90 53.5 171 MIN. WITH UP TO 165 OD TARGET NOTE: THICKER THAN 20mm PLATE IS RECOMMENDED TO INCLUDE A PILOT BORE FOR THE CATHODE. ALL DIMENSIONS IN mm
CM-Series - 80mm ID Target Provided with a flange to fit 80 mm ID target tubes, the CM is the perfect solution to fit smaller spaces. 95 FLANGE FOR 80 ID TARGET TUBE 214 283 DRIVE SHAFT (VARIES) 150 306 80mm MINIMUM DRIVE SHAFT WITH A 20mm WALL (40mm MINIMUM WITH SPECIAL PARTS) 100 TARGET CLAMP Ra0.8 123.00 CLEAN UP 6X 6.80 17 M8X1.25 13 ON A 108 B.C. DO NOT BREAK THRU 20 MIN. 90 53.5 110 MIN. WITH UP TO 100 OD TARGET ALL DIMENSIONS IN mm NOTE: THICKER THAN 20mm PLATE IS RECOMMENDED TO INCLUDE A PILOT BORE FOR THE CATHODE.
SRM-Bar Magnetics The SRM-Bar is designed specifically for the 80mm ID target tube used with the CM-Series external mount end block. ADVANCED MAGNET SYSTEM FEATURES: High strength magnets that are hermetically sealed Advanced magnetics designed using 3D finite element analysis software Magnets are matched in strength within 1% Large magnet, single row design Simple magnetic uniformity tuning Easily installed in any possible orientation SRM-Bar Magnetics 5Year Limited warranty BENEFITS: 5-year limited warranty Superior target utilization and reduced cross corner effects Industry leading magnetic uniformity up to +/- 1% Narrow deposition profile minimizes coating loss to shields Lengthen your campaigns by decrease downtime and increase productivity Adjustable sputter angle when used with our CM-Series external end block SRM-Bar Magnetic Field Model Max Target Diameter Sputter Angle Target Material Utilization SRM 115 mm + 210 >85% Application 80mm ID Targets Acceptable for most material All specifications are for 100mm OD target
Swing Cathode FEATURES: Designed to coat static substrates using a programmable magnet pack with swing motion Customizable drive shaft length Compact and flexible form factor Easy access water seal cartridge Patented power-delivery technology Simple design - fewer parts Patented target water fill/drain feature BENEFITS: Continuously rotating target The programmable magnet pack swings inside the tube Ideal for display or 3D part coating High-packing density; dual cathodes in a 400mm space All utilities are external and remain attached during target changeover High-power with no inductive heating impact No brush dust Simple, in-house maintenance Coater is kept dry during target changes Patent Pending Swing Cathode Simulated Six Cathode Array with TRM NEW SYSTEM INSTALLATIONS: Coater modification and integration support available Our compact design allows chamber design flexibility and the ability to install more cathodes in your system Integrate with TRM-Bar, QRM-Bar or mqrm-bar TM magnetics 100% 75% 50% 25% 0% -800-600 -400-200 0 200 400 600 800 Simulation Position, mm Cathode 1 Cathode 2 Cathode 3 Cathode 4 Cathode 5 Cathode 6 Sum Model Power V/A Target (mm) Up to 200kW DC or SMS* 80 khz MFAC 1500V/450A Up to 4000 Up to 100kW DC or MMS* 80 khz MFAC 1500V/225A Up to 2500 *Also available with CM-Series and MM-Series external end blocks Normalized Thickness < +/-1% uniformity with swing cathodes vs. static target uniformity > +/- 15% Closer TTS is possible with a swing profile Visit our website for a Swing Cathode demonstration
The Swing Cathode TM end block uses the same patented technology as our SC-Series end block to deliver outstanding value, performance, and reliability
Swing-DUO Software Swing-DUO (Dynamic Uniformity Optimization) software is designed to simulate the combined cathode array uniformity for individually optimized motion profiles used to control the motion of the SCI magnet bars when used with our exclusive Swing Cathode. FEATURES: Simulated Four Cathode Swing Array Dwell-based simulation finds the key deposition angles and calculates the amount of time required at each angle. Outputs a CAM table for simplified servo programming - angle and time format Uniformity optimization for constant power or variable power Uniformity optimization refinement using actual measured uniformity results Allows customers to determine the amount of wasted material not deposited on the substrate as a function of the motion profiles Simple and easy to use web-based interface BENEFITS: Quickly design coater configurations for optimal uniformity of deposition Uniformity compensation for systemic issues in the form of motion profile changes. Prevent uniformity drift over the life of the target by creating multiple CAM tables for different target diameters. For a link to the demonstration video, choose the Swing-DUO software from the online products page at sputteringcomponents.com Members of the SCI website can run the software using the following web address: http://swingduo.sputteringcomponents.com/ login Customers will experience improved coating efficiencies in the large area and high aspect ratio coating industries.
RAM-Bar Magnetics Sputtering Components' Remotely Adjustable Magnet Bar or RAM-Bar allows customers to adjust the distance between the magnets and the target surface from outside the system during operation. FEATURES: Self-contained system that utilizes fiber optics for control Compatible with SCI's TRM-Bar, mqrm-bar and QRM-Bar magnet bars Achieve film thickness uniformity of better than +/-1% Two modes of operation including precision uniformity adjustment and constant plasma impedence Movement accuracy of +/- 50µm over the full 20mm range of motion Allows for up to 4mm vertical difference between adjustment locations Robust industrial communication via ethernet gateway Control multiple magnet bars through the coater PLC or a dedicated computer Easy-to-use, customizable operational software BENEFITS: RAM-Bar Magnetics In-situ uniformity and position adjustments eliminates costly system shutdown. Very fine tuning for the most demanding uniformity requirements. Constant impedance mode can reduce process drift and help stabilize the deposition rate throughout the lifetime of the target materials. The batteries are standard rechargeable Li-Ion packs that can quickly and easily be swapped out. Min BT Length Max Target Diameter Adjuster Pitch Adjustable Uniformity 1m 180 mm 12" / 305mm <+/- 1% Application Optical Thin Films with Tight Uniformity Requirements
Advanced Magnetics Our magnetics are designed to provide high quality, uniform coatings for your application. ADVANCED MAGNET SYSTEM FEATURES: Multiple designs to fit your application requirements Advanced magnetics designed using 3D finite element analysis software High-strength magnets that are categorized in-house according to gauss level Fully encapsulated magnets and robust construction for many years of troublefree operation Long-life, multi-roller system for sputter up, sputter down, or off-angle sputtering Simple magnetic uniformity tuning Easily installed in any possible orientation BENEFITS: Industry leading coating uniformity up to +/- 1% Superior target utilization and reduced cross corner effects High deposition rates Lengthen campaign - decrease downtime and increase productivity Adjustable sputter angle Advanced Magnet Bars NEW SYSTEM INSTALLATIONS: Most versatile rotary magnet systems available Use in any orientation Custom length magnet bars to ensure the perfect match for your system UPGRADE OLD MAGNET BARS: Designed to adapt to other end block styles Reduce maintenance costs due to magnet, roller, and bushing replacement Increase process yields by reducing process drift Increase target utilization and save on target costs Fully encapsulated arrays eliminates corroded magnets SCI patented QRM high strength magnet assembly with 90% utilization of a 152mm diameter target.
MAGNETICS FEATURES AND APPLICATIONS TRM-Bar mqrm-bar Small magnet, 3-row design Narrowest deposition profile minimizes coating loss to shields Multiple turn-around design options specific to your application Easy change turn-arounds Target diameters up to 160mm OD Small magnet, 4-row design Patented staggered turnaround design Improved performance and reduced impedance Stable plasma impedance over the life of the target Increased target diameter up to 170mm OD Model QRM-Bar Large magnet, 4-row design Patented staggered turnaround design Improved performance Best plasma impedance stability over the life of the target Largest target diameter up to 180mm OD Max Target Target Material Sputter Angle Diameter Utilization TRM 160 mm + 120 >70% >80%* mqrm 170 mm + 150 >85% QRM 180 mm + 210 >85% All specifications are for 152mm OD targets Application Thin Targets Acceptable for most material Thicker Targets, High Utilization Thickest Targets ITO, Electrical Grade Films *SCI tapered target required for >80% utilization with the TRM
envis-ion DMPTS FEATURES: Flexible mounting options 200+ hours per campaign Hidden electrodes produce minimal contamination Compact design Wide operating pressure (1-40 mtorr) Compatible with other PVD processes Effective source to substrate range of 50-200mm Long electrode life Fast target change BENEFITS: Fits into your existing equipment Fewer process disruptions; longer campaigns Low cost of ownership Promotes film adhesion Reduced chance of substrate damage due to lower ion energies Drives off water vapor and other volatile contaminants from the substrate Wide operating pressure Highly tunable MOUNTING AND INSTALLATION OPTIONS: Surface Energy, Dynes 100 80 60 40 20 Dual Magnetron Pretreatment Source Plasma Pretreatment of Polyethylene Surface Energy Sputtered Aluminum Adhesion 0 0 0.25 0.5 1 2 4 8 16 32 64 128 Treatment Exposure (kw-min/m^2) 5 Adhesion Per ASTM Test #3359 4 3 2 1 Flange: All utilities exit the back of the source through the flange Cantilever: All utilities exit the end Remote: The utilities are flexible and can exit the back, the end, or travel from the source through flexible bellows Model Max Power Typical Power Operating Pressure PET Surface Energy at 6.7m/min DMPTS 5kW/m 2-4 kw/m 1-40 mtorr >65 Dynes
The envis-ion TM Dual Magnetron Pretreatment Source has a wide range of operation for improved adhesion and durability. SOURCE OPENING 93 131 (SUBSTRATE + 80 5) 171 237.5 32.5 115 58 65 65 2X M8X1.25 X 10 DP 3X M10X1.5 X 18 DP REMOTE MOUNTED USING A MINIMUM 145 ID OPENING (ISO 160)
e-cathode Lids SCI provides OEM equipment builders complete turn-key solutions, ready to interface with their systems. SCI can customize these solutions to provide as much controls integration as desired onboard the e-cathode. OEM Digital e-cathode Von Ardenne 1 /Applied Materials 2 Digital Clone End users seeking to add additional cathodes to their system look to SCI for plug-and-play solutions. Our e-cathode TM clones match all your current external mechanical and electrical interfaces but use SCI end blocks, magnet bars, and cathode control systems. DIGITAL AND ANALOG FEATURES: Local and remote control Optional MFC, gas bar, and anode integration Full safety interlocks Customized discrete I/O connector High voltage, quick disconnect included User defined target-to-substrate distance DIGITAL ONLY FEATURES: Integrated PLC and touch panel Real-time monitoring Advanced parameter monitoring Communicates via Ethernet, Profibus, DH+ and more ANALOG ONLY FEATURES: Analog control interface Basic parameter monitoring
e-cathode System Details The e-cathode is a complete cathode solution. SCI e-cathode systems are available in digital and analog styles and are adaptable to meet your needs. SC Model Lid Dimensional Information MIN. LID HEIGHT* 400mm MIN. CHAMBER OPENNING TTS= (75-125mm) NOTE: TTS=TARGET TO SUBSTRATE SUBSTRATE BACKING TUBE = SUBSTRATE + 4x TTS MIN. CHAMBER OPENNING = BACKING TUBE + 440mm * MINIMUM LID HEIGHT WITH LOCAL ELECTRONICS PACKAGE = 450mm MINIMUM LID HEIGHT WITH REMOTE ELECTRONICS PACKAGE = 270mm 195 MIN. CENTER TO CENTER MC Model Lid Dimensional Information MIN. LID HEIGHT* 345mm MIN. CHAMBER OPENNING TTS= (75-125mm) NOTE: TTS=TARGET TO SUBSTRATE SUBSTRATE BACKING TUBE = SUBSTRATE + 4x TTS MIN. CHAMBER OPENNING = BACKING TUBE + 340mm * MINIMUM LID HEIGHT WITH LOCAL ELECTRONICS PACKAGE = 450mm MINIMUM LID HEIGHT WITH REMOTE ELECTRONICS PACKAGE = 270mm 168 MIN. CENTER TO CENTER Feature Digital e-cathode Analog e-cathode Basic e-cathode Onboard logic PLC Relay None Interlocks Full Full HV Only Control Local (touch screen) Remote (Ethernet, Profibus, etc.) Local (lights, switches) Remote (discrete I/O) Water Flow Flow rate (LPM) report Flow switch All sensors wired to the connector Customer supplied, external Water Temperature Water temp report No No Onboard MFC Option Yes No No Differential Pumping Option Yes Yes Yes Customizable Yes (operating hours, kwh, etc.) No No
End Block Upgrades SCI offers direct end block bolt-in replacements for the following major OEMs: Von Ardenne 1 Applied Materials 2 BOC/Airco 3 Bekaert 4 Leybold Optics Lids can be sent to our facility for retrofit or we will provide the components for field upgrades. Trained technicians are also available to help you with your installation. The upgraded systems remain compatible with existing control systems. End block upgrade kit for new generation Von Ardenne 1 Coaters 1 Von Ardenne is a registered trademark of Von Ardenne Anlagentechnik Gmbh. 2 Applied Materials is a registered trademark of Applied Materials, Inc. 3 BOC and Airco are registered trademarks of The BOC Group, Inc. 4 Bekaert is a registered trademark of N.V. BEKAERT S.A. PUBLIC LIMITED COMPANY BELGIUM
System Geometry The following information is important for the installation of your system. "A" CHAMBER OPENING "R" RADIUS (IF APPLICABLE) CHAMBER OPENING "B" CHAMBER OPENING "D" LID THICKNESS DROP-IN CHAMBER DIMENSIONS "E" LID TO SUBSTRATE SUBSTRATE WIDTH "C" INTERNAL CHAMBER TO SUBSTRATE "J" SIDE MOUNT CHAMBER DIMENSIONS INTERNAL CHAMBER HEIGHT "H" SUBSTRATE WIDTH "C" SUBSTRATE TO CHAMBER WALL "G" "I" INTERNAL CHAMBER WIDTH "F" CHAMBER WALL THICKNESS
Sales and Manufacturing Facility: 375 Alexander Drive Owatonna, Minnesota 55060 USA Phone: 507-455-9140 Fax: 507-455-9148 Corporate Office and Accounting: 5625 Brisa Street, Suite B Livermore, California 94550 USA Phone: 925-606-7241 Fax: 925-606-7243 J. Scott Grubb - International Sales Manager Asia-Pacific, India, Australia Cell: 303-887-4915 Email: SGrubb@sputteringcomponents.com John Schmeling - International Sales Manager Europe, Middle East, South America Cell: 507-838-7311 Email: JSchmeling@sputteringcomponents.com Pat Hopwood - Sales Support Specialist Phone: 507-455-9140, Ext. 313 Email: PatH@sputteringcomponents.com Copyright 2015 by Sputtering Components, Inc. Rev. F www.sputteringcomponents.com