Electron Beam Technology Speed up! High Performance Electron Beam Lithography dedicated electron beam lithography
To bridge cutting-edge research and nanofabrication, a dedicated nanolithography solution is needed to span technological and economic interests. A new class of Electron Beam Lithography technology: Innovative system architecture Tolerant to less than optimal laboratory conditions; small footprint Efficient writing better than 1 cm 2 exposed in 1 hour Excellent cost of ownership
VOYAGER A new high-performance e-beam writer with innovative architecture Accurate results, delivered at high speeds and reasonable costs The VOYAGER represents a new class of e-beam writer technology using ewrite technology. Its innovative architecture and specifications have been designed to deliver accurate results at high writing speed and at surprisingly attractive cost of ownership. Built to Raith s standards of excellence, VOYAGER lowers the entrance barriers for dedicated Electron Beam Lithography. ewrite technology: The VOYAGER is the first system that incorporates the new Raith ewrite technology. ewrite combines new dedicated EBL electron optics with the latest innovations in pattern generator design that automates system calibrations and batch fabrication. Fast Smart Innovative The VOYAGER was designed for high speed patterning and automated system calibrations while maintaining precision and resolution. This ensures quick sample turnaround from first design to unloading the sample. The integrated NANOSUITE software is intuitive and ensures even new users to have immediate control of the complete EBL process. VOYAGER was built according to important user requirements and customer feedback. Featuring smart integration into its environment, the VOYAGER s mini-environment offers wide temperature variation and noise tolerance. Long-term Its smart writing stability allows for ultra-high resolution and largest sample handling up to 8 inch wafers. A high-resolution imaging mode and diverse metrology functions add inspection and process control functionality. The VOYAGER represents innovation in both system architecture and application. Innovative writing strategies, such as stitching-error-free modes (traxx and periodixx) or FLEXposure (flexible patterning modes), modern column architecture, and low noise electronics deliver excellent results and push the boundaries in Electron Beam Lithography. VOYAGER is ready for EBL tasks of the future. Pa 1R Profile Width 1 = 7.79 nm 100 nm Pa 1 1 µm Sub-10 nm lines exposed in HSQ resist Flexible patterning modes help to achieve the perfect result here a photonic crystal pattern NANOSUITE screenshot: Easy navigation on holder and sample 3
VOYAGER System characteristics Fast startup, writing and support Long-term stability The high-performance e-beam writer is characterized by speed of use: Intuitive Windows 7 environment Automatic focus and stigmator setup One-click presets for high-resolution or throughput Comprehensive Raith NANOSUITE with GDS II CAD Editor Powerful proximity effect correction Up to 500 µm write fields with real-time dynamic corrections Latest-generation electrostatic deflection 50 MHz pattern generator More than 1 cm²/h (50 % coverage) More than 50 support engineers worldwide provide a service infra structure in all global times zones Automatic switch between throughput and high-resolution mode Profile width 1 = 402.0 nm Pa 1R Pa 1 1µm High density grating exposed in shortest time 10 µm Regular array pattern to improve solar cell efficiency 200 µm 2 µm Automatic switch between throughput and high-resolution mode Smart environment integration, writing and results inspection Numerous features make the VOYAGER a smart dedicated EBL system: Relaxed environment specs: Mini-environment decouples laboratory temperature variation and noise Field-upgradable pattern generator Integrated zoom lens for a stepless wide beam current range High-resolution imaging and metrology for results inspection and process control Adaptive and ultra-flexible alignment strategies, marks of any geometry and position can be used, 2D Fourier transformation-based corrections Profile width 1 = 6,51 nm Pa 1R Pa 1 Mark of any shape, size and position can be used 4
VOYAGER System characteristics Innovative system architecture and writing strategies The VOYAGER sets new standards and pushes the boundaries of Electron Beam Lithography: ewrite technology (see next page) Stitching-error-free modes (see next page): continuous moving stage + moving beam traxx and periodixx Dedicated 3D and anti-counterfeiting applications Efficient handling of very large bitmap data for large-area grayscale bitmap exposure 200 nm HEMT fabrication 2 µm 500 nm 200 nm 3D lithography Photonic crystal tuning Perfect circles exposed using FLEXposure Economical cost of ownership Split-room setup Desk Mini-environment saves room environment costs for the entire lifecycle Small footprint to save costly lab space Through-the-wall-loading setup possible, to keep system outside precious cleanroom space Built-in high-resolution imaging function and sample navigation Economical replacement of filaments instead of gun heads Flexible service and support schemes help to keep cost of ownership low Grey Room for EBL tool Electronics EBL system Cleanroom for sample preparation Loadlock 5
ewrite technology The VOYAGER is the first system that incorporates the new Raith ewrite technology. ewrite combines a new dedicated EBL electron optics with latest innovations in pattern generator design that automates system calibrations and batch fabrication. Speed Accuracy The newly developed electron optics delivers beam current of up to 40 na. A large write field, of 500 µm reduces the need for stage travel and stitching. The 50 MHz pattern generator is built according to the latest standards in electronics design. Its highly efficient data stream solves the challenges of applications in photonics and optics. Thus VOYAGER is able to pattern 1 cm² of complex grayscale bitmap data in less than 1 hour! The large writing field, of 500 µm and the optional 18-bit (optional 20-bit) pattern generator deliver the necessary beam placement accuracy. The necessary off-axis beam shape, focus and deflector corrections are automatically calibrated. Due to single stage deflection, there is no need for subfield handling in hard- and software. This greatly simplifies data handling and system calibrations. Dynamic corrections: stigmation/focus 500 µm field size: center and corner images Without dynamic stigmator and focus With dynamic stigmator and focus High resolution Pa 1R Sub-10 nm guaranteed line width is possible using the state-of-the-art low-noise scan electronics and signal path. 100 nm Pa 1 Profile Width 1 = 7.79 nm Sub-10 nm lines exposed in HSQ resist High-current mode High-resolution mode 6
Innovative and unique writing strategies Conventional step and repeat writing strategies involve stitching-errors. These can be avoided by choosing Raith s unique continuous and stitching error-free writing modes, traxx and periodixx using proprietary fixed beam moving stage (FBMS) and modulated beam moving stage (MBMS) technology for the VOYAGER. Device quality, especially in optical and optoelectronic applications such as large-area gratings, zone lenses, waveguides or photonic crystals can be significantly improved. 1 µm traxx option fixed beam moving stage traxx option fixed beam moving stage periodixx option modulated beam moving stage Writing of complex shapes and ultrasmall nanostructures may require specific exposure strategies for optimum pattern placement accuracy. 1 mm Detailed picture of FBMS lithography mode produced 450 nm wide waveguide structures in silicon master stamp. R. Schmits, TNO Delft, The Netherlands FLEXposure attributing per pattern shape within GDSII, multiple choice of directional patterning in total 5 main operating modes with 47 submodes Raith FLEXposure directional scanning modes and attributes help to optimize pattern fidelity, especially with respect to nm-fabrication tolerances. 10 µm Honeycomb structure fabricated with MBMS technology Part of several-mm-long photonic crystal seamlessly written using MBMS technology 7
Sales Head office A new high-performance e-beam writer with innovative architecture Up to 500 μm write field with dynamic corrections in real time 50 MHz pattern generator 18-bit resolution net at sample pattern generator (20-bit optional) Up to 50 kv for a larger process window Beam current: 50 pa up to 40 na SE (Everhart Thornley) detector Adaptive and ultra-flexible mark recognition schemes Backscatter detector with ASB mode for material contrast (optional) 3D software package including a large-area grayscale bitmap (optional) Stitching-error-free exposure modes (continuous moving stage + moving beam) and writing strategies (FLEXposure) (optional) Product specifications Stitching Overlay Beam position stability Beam current stability Guaranteed grating periodicity Guaranteed line width 25 nm (mean+3σ) 25 nm (mean+3σ) < 200 nm / 8 hours < 0.5 %/ hour 40 nm 10 nm Raith GmbH Konrad-Adenauer-Allee 8 44263 Dortmund, Germany Phone +49 231 95004 0 Fax +49 231 95004 460 Email sales@raith.com Support Europe / Rest of world Phone +49 231 95004 499 Email support@raith.com America Raith America Inc. 1377 Long Island Motor Parkway Suite 101 Islandia, New York 11749 USA Phone +1 631 738 9500 Fax +1 631 738 2055 Email sales@raithamerica.com Support America Phone +1 631 738 9500 Email support@raithamerica.com Asia / Pacific Raith Asia Ltd. Two Chinachem Exchange Square No. 338 King s Road Floor 7, Unit 05-06 North Point Hong Kong Phone +852 2887 6828 Fax +852 2887 6122 Email sales@raithasia.com Support Asia / Pacific Phone +852 2887 6828 Email support@raithasia.com Support and service concept Specifications and system performance are certainly driving decisions; however, there is more to be taken into consideration to ensure an efficient start with a professional worldwide team of trainers and subsequent solid support over the instrument lifetime: All site surveys with environmental measurements, support with resulting cleanroom setup, both factory and on-site accept ances, on-site basic and advanced trainings are included. Moreover, free-of-charge application support infrastructure is available in all global time zones. Service concepts that are affordable for university environments complement these benefits. www.raith.com Your challenge is our mission.