The Transition to Patterned Media in Hard Disk Drives

Transcription

1 The Transition to Patterned Media in Hard Disk Drives The Evolution of Jet and Flash Imprint Lithography for Patterned Media DISKCON San Jose Sept 24 rd, 2009 Paul Hofemann, Vice President, HDD

2 Future Industry Growth Supported by 1 Tb/in2 Era 1,200,000 HDD Unit Demand Units (x1000) 1,000, , , ,000 Areal Density > 1Tb/in2 200, Sources: 1.) HDD Unit Demand: Coughlin Associates Aug 09 2.) Areal Density > 1Tb/in2 Multiple Industry Inputs

3 Areal Density Roadmap The Lifeblood of the HDD Industry Critical Dimension Resolution 1,000 Optical Lithography (TFH) Areal Density (Gbit/in 2 ) CD Resolution (nm) Disk Media Technology Roadmap 10, J-FIL Imprint (Patterned Media) nm 200nm 100nm 50nm 0nm 3 HAMR HAMR Discrete Track Track Bit Bit Pattern Pattern PerpendicularDiscrete LongitudinalPerpendicular Longitudinal

4 The Promise of Patterned Media Discrete Track Media (DTM) enables higher track densities 50% + higher Areal Density Track isolation with nonmagnetic material prevents adjacent track interference Bit Pattern Media will provide further isolation along down track direction 500% + higher Areal Density Discrete Tracks Continuous Media

5 Media Manufacturing Process Wash Sputter Continuous Media COC Lube Burnish Flight Test Wash Planarization Adhesion Promoter Pattern Media Resist Strip / Hard Mask Removal J-FIL Etch or Imprint Ion Implant Template Replication Inspection & Metrology EBR Master Template 5

6 Templates

7 Master Template Design 150 mm 65 mm Fully Patterned DTR Template (Before metal layer Strip) Standard 6-inch round fused silica Rotary e-beam generates master patterned template Fused silica Center mark/barcode Template Auto-alignment Disk Auto-alignment Patterned Media 7

8 Areal Density Defined by Feature Resolution of Master Template >1Tb/in 2 requires advanced feature resolution 65m m Form Factor Capacity/Platter Areal Density Track Pitch Land Groove SPIE BACUS 2009 Western Digital Recent success with self assembly techniques will extend reach beyond EBR Also helps reduce write times

9 Cost Benefits of Template Replication J-FIL Replicator J-FIL Disk Imprinter High Volume Manufacturing 5-10 days per master 10 templates per hour 360 double-sided disks per hour

10 Template Replication Supply Chain TM Perfecta TR1100 Replicated Template Two replication systems sold, shipped and formally accepted into service Based on MII s imprint technology (J-FIL) Provides identical copies of e-beam masters at a fraction of the cost Produces 10 templates/hour (>100X faster than leading edge template writers) Has adopted Perfecta replication system to become a merchant supplier of templates to the HDD market

11 Template Test Patterns Discrete Tracks: 32nm Patterned Media Master Template: 25nm BPM Final imprinted disk Servo Patterns Track address Burst pattern Sector address and data tracks

12 J-FIL Imprint Patterning Wash Sputter COC Lube Burnish Flight Test Wash Planarization Adhesion Promoter Pattern Media Resist Strip / Hard Mask Removal J-FIL Etch or Imprint Ion Implant

13 Patterned Media Lithography Challenges Pattern density variation and structure differences across disk Features dimensions << 40nm Low Cost of Ownership requirements (t put, robustness, yield, etc.) Servo Patterns Candela scan of a 65mm fully patterned disk Discrete Tracks 13

14 Imprint Adhesion Promoter Film Uniformity ~1.0nm ±0.1nm Film Thickness Map (Candela) Key Process Parameters Strong Adhesion force Uniformity Cleanliness High Throughput Adhesion Force LithoPrime Vapor Deposition Adhesion Force (lbf) Slot # in Process Chamber

15 Jet and Flash (J-FIL) Imprint Lithography 10 J-FIL disk tools sold into HDD

16 IntelliJet TM Drop Patterned Technology Enables Pattern Transfer Fidelity + = Volume Map of Pattern Intellijet TM Drop Pattern Technology Dispensed Relative to Pattern (ie., more drops in dense pattern) 15nm RLT Data Track Region Variable Density Pattern 15nm RLT Servo Region

17 J-FIL Technology for Patterned Media

18 TM First Generation J-FILJ Platform for Patterned Media Research Single-Sided 60 dph for initial patterned media research DTR - 50nm half pitch Servo Patterns Imprio 1100 CY06-CY07 DTR - 20nm half pitch Resist on Template BPM - 25nm half pitch Resist Pillars

19 Second Generation J-FILJ TM Platform for Patterned Media Development Emphasis on Double-Sided Disk Imprinting and low Defectivity Robot Cassettes Templates >150 Double-Sided Disks Per Hour GUI Imprio HD2200 CY08-CY09 19

20 3 rd Generation J-FIL J Will Support Industry s s Pilot/Production lines Gb/in Gb/in Gb/in Gb/in Tb/in Tb/in 2 HVM 3 rd Tool Tool ShipmentsS Development (~2x throughput t and ~50% footprint) Imprio HD nd Tool Tool Shipments Development (> 150 dph double-sided) Imprio st Tool Tool Shipments Dev. (60 dph single-sided) 20

21 HVM J-FILJ TM Platform for Pilot & High Volume Manufacturing >1 Tb/in 2 process performance at low manufacturing costs Cassettes Templates GUI 360 double-sided disks/hr 50% footprint compared to Imprio HD2200 Emphasis on low consumables, high yield, robustness, serviceability and full automation 21

22 HVM J-FILJ TM Platform for Pilot & High Volume Manufacturing Molecular Imprints Assembly Floor Shipments begin early next year for pilot lines

23 Cost Of Ownership Improvements MII HDD Platform Total CoO ($ s/disk) $ st Gen (1100) $ nd Gen (HD2200) <$0.35 = 3 rd Gen (HVM) Model Includes: Tool Capital Footprint Uptime Yield Consumables Resist Light Source Adhesion Deposition Provided as estimates only 23

24 Pattern Transfer and Planarization

25 Pattern Transfer and Planarization Solutions Progressing Etch pilot-line capable tool sales have been publicly announced SEM and AFM Example of DTR Etch Reactive Ion Etch (RIE) and Inductively-Coupled (ICP) soft etch Integrated planarization solutions also proposed Trench fill and etch back steps SPIE BACUS Sept 09 NOTE: Ion Implant continues to be investigated. Value proposition if successful is that it replaces magnetic etch, trench fill and planarization

26 Yield Learning

27 Time to Yield Key to Successful Patterned Media Transition Adopting the semiconductor-like yield management paradigm Benchmarking new capital equipment running at manufacturing thoughputs Yield learning of subtle process integration Sample schemes for process tool/line excursion monitoring % Disk Platter Yield Yield Learning Excursion Control Time (months) True Pilot Line Patchwork Pilot Line Virtual Pilot Line Single Fully Automated Fab Floor HVM HVM HVM HVM Single Semi-Automated Fab Floor HVM R&D Mfg Facility A HVM R&D HVM HVM R&D R&D Facility B R&D R&D Facility C R&D

28 Summary J-FIL TM (Jet and Flash Imprint Lithography) 10 PM disk tools sold 2 Replication tools sold Fulfilling its promise as the low cost patterning solution for the HDD Industry Single-sided patterned media RESEARCH has transitioned to double-sided product DEVELOPMENT with PILOT-LINES scheduled to begin in 2010 Process and Metrology Equipment should be ready for next year s pilot-lines Template technology with merchant supply have received a lot of attention this year Pilot-lines placed in a true manufacturing setting using HVM generation equipment will accelerate process integration and yield learning 28