STMicroelectronics L6262S BCD-MOS IC Structural Analysis
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1 April 2, 2004 STMicroelectronics L6262S BCD-MOS IC Structural Analysis For questions, comments, or more information about this report, or for any additional technical needs concerning semiconductor technology, please call Sales at Chipworks.
2 STMicroelectronics L6262S BDC-MOS IC Structural Analysis Table of Contents 1 Overview 1.1 List of Figures and Tables 1.2 Introduction 1.3 Major Findings 2 Device Overview 2.1 Package and Die 2.2 Die Features 3 Process Analysis 3.1 Bond Pads 3.2 Passivation 3.3 Inter-Metal Dielectrics (IMD) and Pre-Metal Dielectric (PMD) 3.4 Metallization 3.5 Vias and Contacts 3.6 MOS Transistors and Polysilicon 3.7 DMOS Transistors 3.8 Bipolar Transistors 3.9 Diode 3.10 Capacitors and Resistors 3.11 Isolation, Wells and Epi 4 Critical Dimensions 4.1 Horizontal Dimensions 4.2 Vertical Dimensions Report Evaluation Rev 1.0 April 2, :48 \\vault-1\projwork\reports\stmicroelectronics\l6262s\sar\sar
3 STMicroelectronics L6262S BCD-MOS IC Overview 1 Overview 1.1 List of Figures and Tables 2 Device Overview Top and Bottom Package Photographs Package X-Ray Die Photograph Die Markings Die Corner Die Corner Die Corner Die Corner Bond Pad Gate Array Bipolar Transistors Single Poly MOS Capacitors 3 Process Analysis General View of the STMicroelectronics L6262S Die Edge Die Seal Bond Pad with Attached Bond Bond Pad Edge Passivation Inter-Metal Dielectric Inter-Metal Dielectric Pre-Metal Dielectric Minimum Pitch Metal Minimum Metal Minimum Pitch Metal Metallization Vertical Dimensions Table Metallization Horizontal Dimensions Table Via Via 1 and Contacts to Diffusion Contacts to Polysilicon Contacts to Diffusion Via and Contact Dimensions Table 1-1 Rev Apr 2, :24 \\edge\projwork\reports\stmicroelectronics\l6262s\sar\sar vsd
4 STMicroelectronics L6262S BCD-MOS IC Overview NMOS Transistor NMOS Transistor Close-Up PMOS Transistor Die Photograph Showing DMOS Transistor Locations DMOS Transistor Cross-Section DMOS Transistor Cross-Section DMOS Transistor Highly Stained DMOS Transistor Body Contact Vertical NPN (Type 1) Transistors in Plan View Vertical NPN (Type 2) Transistors in Plan View Vertical NPN Transistors in Cross-Section (Type 1) Base and Emitter Diffusions Base and Emitter Diffusions Emitter Contact and Diffusion Base Contact and Diffusion Collector Contact and Diffusion NPN Transistor SCM Image Emitter Base Region SCM Image Vertical NPN Transistor in Cross-Section (Type 2) Lateral PNP Transistors Lateral PNP Transistor Cross-Section Lateral PNP Emitter Collector Lateral PNP Transistor Base and Collector Diode Plan View Diode Cross-Section Diode Anode Region Diode Anode Region Heavy Decoration Stain Poly Capacitors in Plan View Poly Capacitors Cross-Section Diffusion Resistors in Plan View Multi-Tapped P-Diffusion Resistors LOCOS Isolation Junction Isolation Scanning Capacitance SCM Image NMOS P-Well 1-2 Rev Apr 2, :24 \\edge\projwork\reports\stmicroelectronics\l6262s\sar\sar vsd
5 About Chipworks Chipworks is the recognized leader in reverse engineering and patent infringement analysis of semiconductors and electronic systems. The company s ability to analyze the circuitry and physical composition of these systems makes them a key partner in the success of the world s largest semiconductor and microelectronics companies. Intellectual property groups and their legal counsel trust Chipworks for success in patent licensing and litigation earning hundreds of millions of dollars in patent licenses, and saving as much in royalty payments. Research & Development and Product Management rely on Chipworks for success in new product design and launch, saving hundreds of millions of dollars in design, and earning even more through superior product design and faster launches. Contact Chipworks To find out more information on this report, or any other reports in our library, please contact Chipworks at: Chipworks 3685 Richmond Rd. Suite 500 Ottawa, Ontario K2H 5B7 Canada T: F: Web site: info@chipworks.com Please send any feedback to feedback@chipworks.com
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